Products
Artificial Crystal Furnace Series
Liquid Phase Epitaxial Furnace
LPE equipment (Liquid Phase Epitaxial) is a device for growing thin film crystals inliquid phase, mainly used for the liquid phase epitaxial growth of compound epitaxial films, the growth of YlG、RlG magneto-optical ferrite single crystal materials, etc. lt is a key process equipment in the development and production of optoelectronic devices.
Vertical Vacuum Sintering Furnace
lt is applied to the growth of optical crystals such as calcium fluoride, magnesium fluoride, lithiumniobate, lithium tantalate, and scintillation crystals such as sodium iodide, cesium iodide, bismuth germanate. lt can also be used to grow new crystal materials such as metal halide perovskites.
It is applied to the growth of laser crystals such as yttrium aluminum garnet (AG) and titanium-doped sapphire, as well as single-crystal materials for optical windows, like calcium fluoride and magnesium fluoride. It also involves the growth processes and properties of new single-crystal materials. By varying growth parameters such as temperature, pressure, and atmosphere, the growth mechanisms and property change laws of single - crystal materials are studied. This provides a basis for the development of new materials with special physical and chemical properties, and promotes cutting-edge research in materials science.