Liquid Phase Epitaxial Furnace
Sunredveichi is committed to providing you with High-Quality Semiconductor Processing Equipment
Main Parameters
● Temperature: 800-1250 ℃
● Temperature zones: 5 zones
● Wafer size: 2-6 inches
● Temperature control accuracy: ±0.1℃
● Constant temperature zone: >180mm
● The temperature difference between the upper and lower points in the constant temperature zone is ±0.1℃
● Crucible speed: 5-90rpm forward and reverse control, accuracy ±0.5rpm
● Seed crystal rod speed:10-1000rpm forward and reverse control, accuracy ±0.5rpm
Main Features
● High degree of automation, the entire process is automatically completed by industrial computer control.
● The coating program has functions such as fixed distance epitaxy and multiple epitaxy.
● Equipped with industrial computer local monitoring and control, as well as remote monitoring and control.
● Equipped with control box online UPS function and power outage protection program.
● Equipped with multi-point temperature compensation function.
● Equipped with various fault alarm and interlock functions.
● Equipped with manual/automatic and autonomous switching functions.
● The software and hardware have axial temperature calibration and detection functions.
● The device supports GEM/SECS/MES control integration with full automation functions.
● Reserve the vacuum function.
High-quality semiconductor processing equipment manufacturer, Everything for the sake of the customer
Tel: +86-18660296696(Mr. Zhang)
+86-18661720798(Mr.Liu)
Address: No. 33 Xianshan East Road, Chengyang District, Qingdao City, Shandong Province, China
