Roll to Roll CVD for Thin Film's Continuous Growth
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  • Roll to Roll CVD for Thin Film's Continuous Growth

Roll to Roll CVD for Thin Film's Continuous Growth

Sunredveichi is committed to providing you with High-Quality Semiconductor Processing Equipment

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Main Parameters(Designed by buyer's request)

● Working temperature: 1020~1050℃ 

● Flat-temperature zone: 1000mm, Five Zone

● Material of Processing Tube: Quartz Tube

● Inner Diameter of Tube: Ф250mm

● Width of copper foil : 200mm

● Running speed of copper foil: 100-400mm/min, adjustable

● Ultimate Pressure: <3Pa, constant-pressure control

 

Main Features

● Graphene's thin film production capacity(industrialization)equipment

● Wide-width roll to roll continuous growth

● APC system: Automatic control by Vacuum butterfly

● Carbon source etc. processing gas was controlled by MFC

● Automatic control of film preparation process

● Three chambers

 

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If you have product needs, please contact us in time to get your exclusive offer.