Roll to Roll CVD for Thin Film's Continuous Growth
Sunredveichi is committed to providing you with High-Quality Semiconductor Processing Equipment
Main Parameters(Designed by buyer's request)
● Working temperature: 1020~1050℃
● Flat-temperature zone: 1000mm, Five Zone
● Material of Processing Tube: Quartz Tube
● Inner Diameter of Tube: Ф250mm
● Width of copper foil : 200mm
● Running speed of copper foil: 100-400mm/min, adjustable
● Ultimate Pressure: <3Pa, constant-pressure control
Main Features
● Graphene's thin film production capacity(industrialization)equipment
● Wide-width roll to roll continuous growth
● APC system: Automatic control by Vacuum butterfly
● Carbon source etc. processing gas was controlled by MFC
● Automatic control of film preparation process
● Three chambers