Single-walled Carbon nanotube Growth Equipment

Sunredveichi is committed to providing you with High-Quality Semiconductor Processing Equipment

peng.liu@sunredvc.com

ruili.zhang@sunredvc.com

Request Quote

This equipment mainly operates based on the principle of chemical vapor deposition. In this process,carbon-containing gases(such as methane and acetylene)serve as carbon sources. They decompose under the action of high temperature and a catalyst. The carbon atoms undergo chemical reactions on the surface of the catalyst and gradually deposit, ultimately growing into single-walled carbon nanotubes.

Main Parameters(Designed by buyer's request)

● Diameter of Heating Zone: φ350mm

● Working Temperature: 600-1200℃

● Temperature control accuracy: <+2℃

Main Features

● Vertical continuous preparation

● Process tube: Large-diameter graphite tube

● Carbon source for carbon nanotube equipment: Atomized spraying, single-head/multi-head

● Heating method: Vertical multi-layer heater

● The equipment can operate continuously for a long time, with special power-saving and characteristic designs

● Disassembly and maintenance of the vertical long process tube: Equipped with special mechanisms and tools

● Hydrogen emission ignition device