Graphene Film Equipment
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  • Graphene Film Equipment

Graphene Film Equipment

Sunredveichi is committed to providing you with High-Quality Semiconductor Processing Equipment

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Vertical Wafer Film Static Growth CVD.

Main Parameters(Designed by buyer's request)

● Diameter of Tube: 250mm

● Flat-temperature Zone: 400mm

● Material of Tube: SlC/quartz

● Ultimate Pressure:<3Pa

● Processing Temperature: 1020~1050℃

 

Main Features

● Graphene film growth production capacity(industrialization)equipment

● APC system: Automatic control by Vacuum butterfly

● Carbon source etc. processing gas was controlled by MFC

● Automatic control of film preparation process

● Rapid cooling

 

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