Graphene Film Equipment
Sunredveichi is committed to providing you with High-Quality Semiconductor Processing Equipment
Vertical Wafer Film Static Growth CVD.
Main Parameters(Designed by buyer's request)
● Diameter of Tube: 250mm
● Flat-temperature Zone: 400mm
● Material of Tube: SlC/quartz
● Ultimate Pressure:<3Pa
● Processing Temperature: 1020~1050℃
Main Features
● Graphene film growth production capacity(industrialization)equipment
● APC system: Automatic control by Vacuum butterfly
● Carbon source etc. processing gas was controlled by MFC
● Automatic control of film preparation process
● Rapid cooling